ion source
英 [ˈaɪən sɔːs]
美 [ˈaɪən sɔːrs]
n. 离子源
双语例句
- A new electron impact storage ion source has been designed for time of flight mass spectrometers with a high mass resolving power and high sensitivity.
电子轰击存贮型脉冲离子源是为高分辨率、高灵敏度飞行时间质谱仪设计的新型离子源。 - In this paper, Development of liquid metal ion source for nanometer focused ion beam system is introduced.
叙述了为纳米聚焦离子束装置研制的镓液态金属离子源的制备。 - Special high-voltage device is composed of ion source, accelerated system, target etc, and it is a mini accelerator.
特种高压器件主要由离子源、加速系统、靶子等组成，是一种微型加速器。 - The theory of ion etching and the parameter of ion source designing are discussed in detail.
并且详细论述离子刻蚀的原理以及离子源的参数设计。 - High-voltage glow-discharge ion source
高压辉光放电离子源 - The effect of the variation in discharge parameters on the discharge characteristics in the ion source with multi-magnetic pole cusp field
会切场离子源放电参数的变化对放电特性的影响 - It may be sure that the technology of ion source will be put to a new level by the development of the microwave ECR plasma.
可以确信，微波电子回旋共振等离子体的发展，将把离子源技术提高到一个新的水平。 - Influence of bias voltage of APS ion source on performance of hafnium films deposited with ion-assisted technology
离子束辅助工艺中APS源偏转电压对HfO2薄膜性能的影响 - Students who are interested on ion source and ion beam optics and engineering of neutral beam injection are welcomed.
目前主要从事中性束技术的研究，可招收物理工程类专业的研究生。 - Main interests are ion source, beam line and plasma physical experiments.
主要从事离子源，离子光学，中性束注入加热和诊断研究。 - Novel Chemical Ion Source for a High-Field Asymmetric Waveform I Mobility Spectrometer Used under Ambient Conditions
一种用于高场非对称波形离子迁移谱系统的新型敞开式化学离子源 - KEYWORDS: GIMS, ion source, anode layer, sputtering, TiN, ion plating, medium frequency, pulsed DC. Influences of solar flare bursts and partical precipitation on the lower ionosphere have been observed by means of VLF propagation effects at Zhongshan Station in Antarctica.
中文关键词：气离溅射、子源、极层流、射、化钛、子镀膜、频、冲直流。在南极中山站利用甚低频传播手段观测太阳耀斑爆发及极区粒子沉降对低电离层的影响。 - Study on detection of benzene in water using proton transfer reaction mass spectrometry with a glow discharge ion source
辉光放电离子源质子转移反应质谱对水中苯的分析方法研究 - Ion beam neutralization of broad beam cold cathode ion source
宽束冷阴极离子源分时中和技术的研究 - The primary advantage of plasma, as opposed to the ion source approach, is its ability to fill in the vacuum chamber and the couple with evaporant.
相对于离子源，等离子体的最主要优点是等离子体可以填充真空箱，耦合蒸发剂。 - A cathode in an indirectly heated cathode ion source is supported by at least one rod or pin.
非直接加热阴极式离子源的阴极被至少一个杆或钉支撑。 - To achieve co-implantation without additional ion sources, the required implants are mixed to form a cathode of MEVVA ion source.
将不同单质机械混合，在不增加注入机离子源数目的基础上实现了不同离子的共注入。 - A law exists in experiments by which the metal and halogen ions are extracted from HF ion source by applying plasma chemical reaction.
高频离子源中等离子体化学反应引出金属和卤素离子的实验中，存在一个规律性的东西。 - His current main research interest covers the ion source and neutral beam engineering, the supply powers of ion source, control and data acquisition of the neutral beam injection.
现研究方向为托卡马克中性束注入加热技术的内容，主要研究课题为强流离子源源头电源系统及中性束束线测量控制系统等。 - Long pulse ion source discharge based on plasma density feedback
利用密度反馈实现离子源长脉冲放电 - A numerical calculation of three dimensional electric field in the central region with 20 ° rotation of ion source
离子源转动20°后中心区的三维电场数值计算 - Plasma characteristics of an RF ion source were investigated by emission spectroscopy.
采用发射光谱法研究了高频离子源的等离子体性质。 - Secondly, emitting theory of liquid metal ion source is introduced.
其次介绍了液态金属离子源的发射机理； - Film uniformity is an important problem in application of pulsed vacuum arc ion source.
镀膜均匀性是脉冲真空电弧离子源应用需要解决的一个重要问题。 - The working principle and structure of a surface ionization ion source with high current is described systematically.
本文系统地描述了强流表面电离离子源的工作原理和结构。 - Using End-Hall ion source, the application of ion beam cleaning on the laser films is investigated.
介绍了在激光薄膜中EndHall型离子源离子束清洗的应用。 - TITAN ion source is a new ion source which can produce strong metal and gas ion beam. Use.
TITAN离子源是一种新的能够同时产生强金属和气体离子束流的离子源。 - The main parts of the neutron tube include ion source, accelerator, air pressure system and the target.
中子管的主要部分有离子源，加速器，气压调节系统和靶。 - The MEMS ion source is achieved by ICP, sputtering and bonding technology, etc.
通过ICP、溅射和键合等工艺实现了该结构的MEMS离子源。